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ASML’s PAS 2500/40 stepper with a well proven Zeiss 0.40NA i-line lens with a 21.1mm image field diameter. PAS 2500/40 stepper has been designed for 0.7micron production resolutions using a “process in-depended” alignment system, for a superior production overlay., makes the system a well proven workhorse.
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ASML PAS2500/40 i-line wafer stepper:

  • Lens resolution 0.7 micron i-line (365nm)

  • Reduction 5X

  • Field size 21.2 mm dia ( Xmax= 15mm, Ymax= 19mm )

  • UDOF 2.1micron ( Slope > 83 degrees )

  • Uniformity ± 3%

  • Intensity 200 - 420 mW/c㎡ (PEP option depended)

  • Reticles 6 (5”), automatic exchange and masking

  • Wafers 100, 125, 150 mm

  • Overlay (99.7% of data)
    single machine < 150 nm
    mach. to ref. mach < 250 nm
    mach. to mach < 300 nm

  • Throughput at 100 mJ/cm
    6”, 55 exp. 47 - 70 WPH (PEP option depended )
    5”, 35 exp. 60 - 89 WPH(PEP option depended )
    4”, 21 exp. 74 – 109 WPH(PEP option depended )

  • TEL

    +86 21 67693080

  • E-MAIL

    sales@simaxat.com

Simax Shanghai Company Limited
ADDRESS：No.255, SizhuanNan Road, Building 130,
Songjiang district,Shanghai,China.201612.
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